GENEVA, May 13 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中央区日本橋二丁目５番１号) filed a patent application (PCT/JP2024/039070) for "RESIST UNDERLAYER FILM FORMATION COMPOSITION" on Nov 01, 2024. With publication no. WO/2025/095106, the details related to the patent application was published on May 08, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): KAMIBAYASHI Satoshi (c/o Materials ...