GENEVA, Oct. 27 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中央区日本橋二丁目５番１号) filed a patent application (PCT/JP2025/011698) for "PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING INSULATION FILM" on Mar 25, 2025. With publication no. WO/2025/220442, the details related to the patent application was published on Oct 23, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): CHIBA Rou (c/o Mat...