INTERNATIONAL PATENT: NISSAN CHEMICAL CORPORATION, 日産化学株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING MACHINED SEMICONDUCTOR SUBSTRATE"

GENEVA, Sept. 30 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中央区日本橋二丁目５番１号) filed a patent application (PCT/JP2025/011124) for "METHOD FOR MANUFACTURING MACHINED SEMICONDUCTOR SUBSTRATE" on Mar 21, 2025. With publication no. WO/2025/198034, the details related to the patent application was published on Sep 25, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): YAGYU Masafumi (c/o ...