INTERNATIONAL PATENT: NIKON CORPORATION, 株式会社ニコン FILES APPLICATION FOR "METHOD FOR PRODUCING PHOTOMASK SUBSTRATE, METHOD FOR PRODUCING PHOTOMASK BLANKS, METHOD FOR PRODUCING PHOTOMASK, METHOD FOR REUSING PHOTOMASK SUBSTRATE, PHOTOMASK SUBSTRATE, PHOTOMASK BLANKS, PHOTOMASK AND DEVICE FOR PROCESSING QUARTZ GLASS SUBSTRATE"

GENEVA, Nov. 4 -- NIKON CORPORATION (1-5-20, Nishioi, Shinagawa-ku, Tokyo1408601), 株式会社ニコン (東京都品川区西大井１－５－２０) filed a patent application (PCT/JP2025/015255) for "METHOD FOR PRODUCING PHOTOMASK SUBSTRATE, METHOD FOR PRODUCING PHOTOMASK BLANKS, METHOD FOR PRODUCING PHOTOMASK, METHOD FOR REUSING PHOTOMASK SUBSTRATE, PHOTOMASK SUBSTRATE, PHOTOMASK BLANKS, PHOTOMASK, AND DEVICE FOR PROCESSING QUARTZ GLASS SUBSTRATE" on Apr 18, 2025. With publication no. WO/2025/225530, the details related to the patent application was published on Oct 30, 2025.

Notably, the patent application was submitted unde...