INTERNATIONAL PATENT: NIKA OPTICS (TIANJIN) CO., LTD., 尼卡光学（天津）有限公司 FILES APPLICATION FOR "METHOD FOR IMPROVING DISPLAY UNIFORMITY OF VOLUMETRIC HOLOGRAPHIC OPTICAL WAVEGUIDE AND APPARATUS"

GENEVA, Nov. 2 -- NIKA OPTICS (TIANJIN) CO., LTD. (201-29, Building 4, No. 188 Rixin Road, Binhai Science & Technology Park, Binhai New AreaTianjin 300000), 尼卡光学（天津）有限公司 (中国天津市滨海新区滨海科技园日新道188号4号楼201-29) filed a patent application (PCT/CN2024/144513) for "METHOD FOR IMPROVING DISPLAY UNIFORMITY OF VOLUMETRIC HOLOGRAPHIC OPTICAL WAVEGUIDE, AND APPARATUS" on Dec 31, 2024. With publication no. WO/2025/222942, the details related to the patent application was published on Oct 30, 2025.

Notably, the patent application was sub...