INTERNATIONAL PATENT: NEW RAY MASK TECHNOLOGY CORPORATION, 广州新锐光掩模科技有限公司 FILES APPLICATION FOR "OPTICAL MASK AND OVERLAP ERROR MEASUREMENT METHOD"

GENEVA, May 16 -- NEW RAY MASK TECHNOLOGY CORPORATION (No. 2, Xinxinguang 1st Street, Xinxinguang Industrial Park, Huangpu DistrictGuangzhou, Guangdong 510799), 广州新锐光掩模科技有限公司 (中国广东省广州市黄埔区新芯光产业园新芯光一街2号) filed a patent application (PCT/CN2024/096218) for "OPTICAL MASK, AND OVERLAP ERROR MEASUREMENT METHOD" on May 30, 2024. With publication no. WO/2025/097739, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the Inte...