INTERNATIONAL PATENT: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, 国立研究開発法人産業技術総合研究所 FILES APPLICATION FOR "SYNTHETIC RESIN DEGRADATION METHOD"

GENEVA, July 8 -- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (3-1, Kasumigaseki 1-chome, Chiyoda-Ku Tokyo1008921), 国立研究開発法人産業技術総合研究所 (東京都千代田区霞が関１丁目３番１号) filed a patent application (PCT/JP2024/040082) for "SYNTHETIC RESIN DEGRADATION METHOD" on Nov 12, 2024. With publication no. WO/2025/142164, the details related to the patent application was published on Jul 03, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is ma...