GENEVA, Nov. 25 -- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (3-1, Kasumigaseki 1-chome, Chiyoda-ku, Tokyo1008921), 国立研究開発法人産業技術総合研究所 (東京都千代田区霞が関１丁目３番１号) filed a patent application (PCT/JP2025/017102) for "INSULATING MATERIAL, SUBSTRATE, AND METHOD FOR MANUFACTURING INSULATING MATERIAL" on May 09, 2025. With publication no. WO/2025/239305, the details related to the patent application was published on Nov 20, 2025.
Notably, the patent application was submitted under the International...