INTERNATIONAL PATENT: MITSUBISHI MATERIALS CORPORATION, 三菱マテリアル株式会社 FILES APPLICATION FOR "SILICON ELECTRODE PLATE FOR PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SAME"

GENEVA, Dec. 1 -- MITSUBISHI MATERIALS CORPORATION (2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo1008117), 三菱マテリアル株式会社 (東京都千代田区丸の内三丁目２番３号) filed a patent application (PCT/JP2025/018439) for "SILICON ELECTRODE PLATE FOR PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SAME" on May 21, 2025. With publication no. WO/2025/244066, the details related to the patent application was published on Nov 27, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intelle...