GENEVA, Dec. 1 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東京都千代田区丸の内二丁目５番２号) filed a patent application (PCT/JP2025/017656) for "SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE, LIQUID COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE" on May 15, 2025. With publication no. WO/2025/243917, the details related to the patent application was published on Nov 27, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which i...