GENEVA, Jan. 13 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東京都千代田区丸の内二丁目５番２号) filed a patent application (PCT/JP2025/023428) for "REMOVAL METHOD, SOLUTION COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE" on Jun 30, 2025. With publication no. WO/2026/009862, the details related to the patent application was published on Jan 08, 2026.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectua...