INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "IODINE-CONTAINING (METH)ACRYLATE COMPOUND, IODINE-CONTAINING (METH)ACRYLATE (CO)POLYMER, LITHOGRAPHY COMPOSITION, RESIST COMPOSITION, BOTTOM LAYER-FORMING COMPOSITION AND METHOD FOR PRODUCING IODINE-CONTAINING (METH)ACRYLATE COMPOUND"

GENEVA, April 29 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東京都千代田区丸の内二丁目５番２号) filed a patent application (PCT/JP2024/036924) for "IODINE-CONTAINING (METH)ACRYLATE COMPOUND, IODINE-CONTAINING (METH)ACRYLATE (CO)POLYMER, LITHOGRAPHY COMPOSITION, RESIST COMPOSITION, BOTTOM LAYER-FORMING COMPOSITION, AND METHOD FOR PRODUCING IODINE-CONTAINING (METH)ACRYLATE COMPOUND" on Oct 17, 2024. With publication no. WO/2025/084340, the details related to the patent application was published on Apr 24, 2025....