GENEVA, Sept. 9 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東京都千代田区丸の内二丁目５番２号) filed a patent application (PCT/JP2025/002444) for "COMPOUND, COMPOSITION, COMPOSITION FOR FORMING FILM FOR SEMICONDUCTOR LITHOGRAPHY, AND COMPOSITION FOR FORMING RESIST FILM FOR SEMICONDUCTOR LITHOGRAPHY" on Jan 27, 2025. With publication no. WO/2025/182386, the details related to the patent application was published on Sep 04, 2025.
Notably, the patent application was submitted under the International Patent Class...