GENEVA, June 24 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東京都千代田区丸の内二丁目５番２号) filed a patent application (PCT/JP2024/043722) for "COMPOSITION FOR SEMICONDUCTOR SUBSTRATE CLEANING, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE" on Dec 11, 2024. With publication no. WO/2025/127048, the details related to the patent application was published on Jun 19, 2025.
Notably, the patent application was submitted under the International Patent Classification...