GENEVA, April 20 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東京都千代田区丸の内二丁目5番2号) filed a patent application (PCT/JP2024/036234) for "COMPOSITION, RESIN COMPOSITION, COMPOSITION FOR FILM FORMATION, COMPOSITION FOR FORMING LITHOGRAPHIC FILM, AND COMPOSITION FOR FORMING RESIST FILM" on Oct 10, 2024. With publication no. WO/2025/079631, the details related to the patent application was published on Apr 17, 2025.

Notably, the patent application was submitted under the International Patent Classifica...