INTERNATIONAL PATENT: MITSUBISHI CHEMICAL CORPORATION, 三菱ケミカル株式会社, NATIONAL INSTITUTES FOR QUANTUM SCIENCE AND TECHNOLOGY, 国立研究開発法人量子科学技術研究開発機構 FILES APPLICATION FOR "COMPOUND, PHOTOSENSITIVE COMPOSITION CONTAINING SAID COMPOUND, PATTERN FORMING METHOD USING SAID COMPOSITION, SUBSTRATE AND METHOD FOR PRODUCING SUBSTRATE"

GENEVA, Jan. 13 -- MITSUBISHI CHEMICAL CORPORATION (1-1 Marunouchi 1-chome, Chiyoda-ku, Tokyo1008251), 三菱ケミカル株式会社 (東京都千代田区丸の内一丁目１番１号), NATIONAL INSTITUTES FOR QUANTUM SCIENCE AND TECHNOLOGY (4-9-1, Anagawa, Inage-ku, Chiba-shi, Chiba2638555), 国立研究開発法人量子科学技術研究開発機構 (千葉県千葉市稲毛区穴川四丁目９番１号) filed a pa...