INTERNATIONAL PATENT: MATSUDA SANGYO COMPANY LIMITED, 松田産業株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING VAPOR DEPOSITION MATERIAL"

GENEVA, Sept. 30 -- MATSUDA SANGYO COMPANY LIMITED (26-2, Nishishinjuku 1-chome, Shinjuku-ku, Tokyo1630558), 松田産業株式会社 (東京都新宿区西新宿一丁目２６番２号) filed a patent application (PCT/JP2025/009606) for "METHOD FOR PRODUCING VAPOR DEPOSITION MATERIAL" on Mar 13, 2025. With publication no. WO/2025/197745, the details related to the patent application was published on Sep 25, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): KOBAYASHI, T...