INTERNATIONAL PATENT: LAM RESEARCH CORPORATION FILES APPLICATION FOR "SELECTIVE ETCH OF STACK USING A HYDROGEN CHLORIDE GAS AND FLUORINE CONTAINING GAS"

GENEVA, Dec. 31 -- LAM RESEARCH CORPORATION (4650 Cushing ParkwayFremont, California 94538) filed a patent application (PCT/US2025/033056) for "SELECTIVE ETCH OF STACK USING A HYDROGEN CHLORIDE GAS AND FLUORINE CONTAINING GAS" on Jun 10, 2025. With publication no. WO/2025/264438, the details related to the patent application was published on Dec 26, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): GOHIRA, Taku (c/o Lam Research Corporation4650 Cushing Parkway, M/S CA-1Fremont, California 94538), MORAVEJ, Maryam (c/o Lam Research Corporation4650 Cushing Parkway, M/S CA-1Fremont, California 945...