INTERNATIONAL PATENT: LAM RESEARCH CORPORATION FILES APPLICATION FOR "ATOMIC LAYER DEPOSITION WITH INHIBITION AND IN-SITU PASSIVATION AND HARDMASK PROTECTION DURING ETCHING OF A GAPFILL FILM"

GENEVA, May 19 -- LAM RESEARCH CORPORATION (4650 Cushing ParkwayFremont, California 94538) filed a patent application (PCT/US2024/055002) for "ATOMIC LAYER DEPOSITION WITH INHIBITION AND IN-SITU PASSIVATION, AND HARDMASK PROTECTION DURING ETCHING OF A GAPFILL FILM" on Nov 07, 2024. With publication no. WO/2025/101810, the details related to the patent application was published on May 15, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): ZHANG, Tao (4650 Cushing ParkwayFremont, California 94538), CURTIN, Ian John (4650 Cushing ParkwayFremont, California 94538), AGARWAL, Pulkit (4650 Cushing Par...