INTERNATIONAL PATENT: L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE, AMERICAN AIR LIQUIDE, INC. FILES APPLICATION FOR "SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PROCESSES"

GENEVA, May 28 -- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (75 Quai d'Orsay75007 Paris), AMERICAN AIR LIQUIDE, INC. (46409 Landing ParkwayFremont, CA 94538) filed a patent application (PCT/US2024/055218) for "SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PROCESSES" on Nov 08, 2024. With publication no. WO/2025/106358, the details related to the patent application was published on May 22, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): STAFFORD, Nathan (200 GBC DriveNewark, DE 19701)

Abstract: A method for forming a struct...