INTERNATIONAL PATENT: KOLON INDUSTRIES, INC., 코오롱인더스트리 주식회사 FILES APPLICATION FOR "DRY FILM PHOTORESIST USING PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PREPARING SAME, RESIST PATTERN AND DISPLAY DEVICE"

GENEVA, June 11 -- KOLON INDUSTRIES, INC. (110, Magokdong-ro,Gangseo-gu,Seoul 07793), 코오롱인더스트리 주식회사 (서울특별시강서구마곡동로 110) filed a patent application (PCT/KR2024/016669) for "DRY FILM PHOTORESIST USING PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PREPARING SAME, RESIST PATTERN, AND DISPLAY DEVICE" on Oct 29, 2024. With publication no. WO/2025/116313, the details related to the patent application was published on Jun 05, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Proper...