INTERNATIONAL PATENT: KOKUSAI ELECTRIC CORPORATION, 株式会社ＫＯＫＵＳＡＩ ＥＬＥＣＴＲＩＣ FILES APPLICATION FOR "GAS SUPPLY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE PROCESSING APPARATUS AND PROGRAM AND FLOW RATE CONTROLLER"

GENEVA, July 8 -- KOKUSAI ELECTRIC CORPORATION (3-4, Kandakaji-cho, Chiyoda-ku, Tokyo1010045), 株式会社ＫＯＫＵＳＡＩ　ＥＬＥＣＴＲＩＣ (東京都千代田区神田鍛冶町３丁目４番地) filed a patent application (PCT/JP2023/047106) for "GAS SUPPLY METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE PROCESSING APPARATUS AND PROGRAM, AND FLOW RATE CONTROLLER" on Dec 27, 2023. With publication no. WO/2025/141825, the details related to the patent application was published on Jul 03, 2025.

Notably, the patent application...