INTERNATIONAL PATENT: KOFLOC CORP., コフロック株式会社, NABEYA BI-TECH KAISHA, 鍋屋バイテック株式会社 FILES APPLICATION FOR "TEMPERATURE MEASUREMENT AND STATIC ELIMINATION STRUCTURE USING SILICON CARBIDE"

Posted On: 2025-06-16

GENEVA, June 16 -- KOFLOC CORP. (1-3, Atenoki, Kusauchi, Kyotanabe-shi, Kyoto6100311), コフロック株式会社 (京都府京田辺市草内当ノ木１番地の３), NABEYA BI-TECH KAISHA (1, Toko-Taichi, Seki-shi, Gifu5013939), 鍋屋バイテック株式会社 (岐阜県関市桃紅大地１番地) filed a patent application (PCT/JP2023/043589) for "TEMPERATURE MEASUREMENT AND STATIC ELIMINATION STRUCTURE USING SILICON CARBIDE" on Dec 06, 2023. With publication no. WO/2025/120762, the details r...

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इस लेख के रीप्रिंट को खरीदने या इस प्रकाशन का पूरा फ़ीड प्राप्त करने के लिए, कृपया हमे संपर्क करें.

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INTERNATIONAL PATENT: KOFLOC CORP., コフロック株式会社, NABEYA BI-TECH KAISHA, 鍋屋バイテック株式会社 FILES APPLICATION FOR "TEMPERATURE MEASUREMENT AND STATIC ELIMINATION STRUCTURE USING SILICON CARBIDE"