INTERNATIONAL PATENT: JX ADVANCED METALS CORPORATION, ＪＸ金属株式会社 FILES APPLICATION FOR "SPUTTERING TARGET ASSEMBLY AND FILM"

GENEVA, May 27 -- JX ADVANCED METALS CORPORATION (10-4, Toranomon 2-chome, Minato-ku, Tokyo1058417), ＪＸ金属株式会社 (東京都港区虎ノ門二丁目１０番４号) filed a patent application (PCT/JP2024/039839) for "SPUTTERING TARGET ASSEMBLY AND FILM" on Nov 08, 2024. With publication no. WO/2025/105309, the details related to the patent application was published on May 22, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MORIOKA,Akira (c/o Isohara Works,JX Adv...