GENEVA, Oct. 5 -- JX ADVANCED METALS CORPORATION (10-4, Toranomon 2-chome, Minato-ku, Tokyo1058417), ＪＸ金属株式会社 (東京都港区虎ノ門二丁目１０番４号) filed a patent application (PCT/JP2024/043467) for "DRY FILM RESIST AND METHOD FOR FORMING CIRCUIT PATTERN" on Dec 09, 2024. With publication no. WO/2025/203899, the details related to the patent application was published on Oct 02, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).
Inventor(s): YAMASHITA,Takashi (c...