INTERNATIONAL PATENT: JTEC CORPORATION, 株式会社ジェイテックコーポレーション, OSAKA UNIVERSITY, 国立大学法人大阪大学 FILES APPLICATION FOR "PLASMA-ASSISTED POLISHING METHOD AND DEVICE THEREFOR"

Posted On: 2025-04-15

GENEVA, April 15 -- JTEC CORPORATION (2-5-38, Saitoyamabuki, Ibaraki-shi, Osaka5670086), 株式会社ジェイテックコーポレーション (大阪府茨木市彩都やまぶき２－５－３８), OSAKA UNIVERSITY (1-1, Yamadaoka, Suita-shi, Osaka5650871), 国立大学法人大阪大学 (大阪府吹田市山田丘１番１号) filed a patent application (PCT/JP2024/035095) for "PLASMA-ASSISTED POLISHING METHOD AND DEVICE THEREFOR" on Oct 01, 202...

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INTERNATIONAL PATENT: JTEC CORPORATION, 株式会社ジェイテックコーポレーション, OSAKA UNIVERSITY, 国立大学法人大阪大学 FILES APPLICATION FOR "PLASMA-ASSISTED POLISHING METHOD AND DEVICE THEREFOR"