INTERNATIONAL PATENT: JSW AFTY CORPORATION, ＪＳＷアフティ株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE"

GENEVA, Sept. 9 -- JSW AFTY CORPORATION (2-1, Fukuura 2-chome, Kanazawa-ku, Yokohama-shi, Kanagawa2360004), ＪＳＷアフティ株式会社 (神奈川県横浜市金沢区福浦二丁目２番地１号) filed a patent application (PCT/JP2025/003902) for "METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE" on Feb 06, 2025. With publication no. WO/2025/182513, the details related to the patent application was published on Sep 04, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property O...