INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社, THE UNIVERSITY OF TOKYO, 国立大学法人　東京大学, TOHOKU UNIVERSITY, 国立大学法人東北大学 FILES APPLICATION FOR "ANTIFERROMAGNETIC MATERIAL WITH LARGE ANOMALOUS HALL EFFECT"

Posted On: 2025-06-24

GENEVA, June 24 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東新橋一丁目９番２号), THE UNIVERSITY OF TOKYO (3-1, Hongo 7-chome, Bunkyo-ku, Tokyo1138654), 国立大学法人　東京大学 (東京都文京区本郷七丁目３番１号), TOHOKU UNIVERSITY (2-1-1, Katahira, Aoba-ku, Sendai-shi, Miyagi9808577), 国立大学法人東北大学 (宮城県仙...

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INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社, THE UNIVERSITY OF TOKYO, 国立大学法人　東京大学, TOHOKU UNIVERSITY, 国立大学法人東北大学 FILES APPLICATION FOR "ANTIFERROMAGNETIC MATERIAL WITH LARGE ANOMALOUS HALL EFFECT"

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INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社, THE UNIVERSITY OF TOKYO, 国立大学法人 東京大学, TOHOKU UNIVERSITY, 国立大学法人東北大学 FILES APPLICATION FOR "ANTIFERROMAGNETIC MATERIAL WITH LARGE ANOMALOUS HALL EFFECT"

INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社, THE UNIVERSITY OF TOKYO, 国立大学法人　東京大学, TOHOKU UNIVERSITY, 国立大学法人東北大学 FILES APPLICATION FOR "ANTIFERROMAGNETIC MATERIAL WITH LARGE ANOMALOUS HALL EFFECT"