INTERNATIONAL PATENT: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES, 中国科学院微电子研究所 FILES APPLICATION FOR "OPTIMIZATION METHOD FOR MASK ABSORPTION MATERIAL BASED ON SURFACE PLASMA MULTILAYER FILM STRUCTURE AND PLASMONIC SUPERLENS"

GENEVA, July 7 -- INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES (No. 3 Beitucheng West RoadChaoyang District, Beijing 100029), 中国科学院微电子研究所 (中国北京市朝阳区北土城西路3号) filed a patent application (PCT/CN2023/142635) for "OPTIMIZATION METHOD FOR MASK ABSORPTION MATERIAL BASED ON SURFACE PLASMA MULTILAYER FILM STRUCTURE, AND PLASMONIC SUPERLENS" on Dec 28, 2023. With publication no. WO/2025/137984, the details related to the patent application was published on Jul 03, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC...