INTERNATIONAL PATENT: INNO CIRCUITS LIMITED, 四川英创力电子科技股份有限公司 FILES APPLICATION FOR "28-LAYER 8-STEP ULTRA HDI AND FABRICATION METHOD THEREFOR"

GENEVA, Sept. 20 -- INNO CIRCUITS LIMITED (No. 1, Zhangshulin Road, Economic and Technological Development ZoneSuining, Sichuan 629000), 四川英创力电子科技股份有限公司 (中国四川省遂宁市经济技术开发区樟树林路1号) filed a patent application (PCT/CN2025/073878) for "28-LAYER 8-STEP ULTRA HDI AND FABRICATION METHOD THEREFOR" on Jan 22, 2025. With publication no. WO/2025/189975, the details related to the patent application was published on Sep 18, 2025.

Notably, the patent application was submitted under the International Patent Classifi...