GENEVA, Feb. 4 -- HOYA CORPORATION (6-10-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo1608347), ＨＯＹＡ株式会社 (東京都新宿区西新宿六丁目１０番１号) filed a patent application (PCT/JP2024/026655) for "MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE" on Jul 25, 2024. With publication no. WO/2025/023299, the details related to the patent application was published on Jan 30, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World I...