GENEVA, Oct. 5 -- HOYA CORPORATION (6-10-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo1608347), ＨＯＹＡ株式会社 (東京都新宿区西新宿六丁目１０番１号) filed a patent application (PCT/JP2025/010344) for "CONDUCTIVE FILM-EQUIPPED SUBSTRATE, MULTILAYER REFLECTIVE FILM-EQUIPPED SUBSTRATE, MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE" on Mar 18, 2025. With publication no. WO/2025/205214, the details related to the patent application was published on Oct 02, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which ...