GENEVA, July 8 -- HORIBA STEC, CO., LTD. (11-5, Hokotate-cho, Kamitoba, Minami-ku, Kyoto-shi, Kyoto6018116), 株式会社堀場エステック (京都府京都市南区上鳥羽鉾立町１１番地５) filed a patent application (PCT/JP2024/044607) for "CLEANING DEVICE AND SUBSTRATE PROCESSING SYSTEM" on Dec 17, 2024. With publication no. WO/2025/142639, the details related to the patent application was published on Jul 03, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organi...