GENEVA, March 17 -- HITACHI INDUSTRIAL EQUIPMENT SYSTEMS CO., LTD. (1-5-1, Sotokanda, Chiyoda-ku, Tokyo1010021), 株式会社日立産機システム (東京都千代田区外神田一丁目５番１号) filed a patent application (PCT/JP2024/024564) for "DC INSULATION RESISTANCE MONITORING DEVICE AND DC INSULATION RESISTANCE MONITORING METHOD" on Jul 08, 2024. With publication no. WO/2025/052773, the details related to the patent application was published on Mar 13, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by ...