GENEVA, March 31 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号) filed a patent application (PCT/JP2023/034173) for "SCANNING ELECTRON MICROSCOPE WITH INSPECTION AND MEASUREMENT MODEL, AND METHOD FOR CORRECTING INSPECTION AND MEASUREMENT MODEL" on Sep 21, 2023. With publication no. WO/2025/062546, the details related to the patent application was published on Mar 27, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed b...