GENEVA, Aug. 25 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目17番1号) filed a patent application (PCT/JP2024/005439) for "MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND MEASUREMENT RECIPE CREATION METHOD" on Feb 16, 2024. With publication no. WO/2025/173220, the details related to the patent application was published on Aug 21, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (W...