INTERNATIONAL PATENT: HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク, NODA RF TECHNOLOGIES CO., LTD., 株式会社ノダＲＦテクノロジーズ FILES APPLICATION FOR "PLASMA PROCESSING DEVICE"

Posted On: 2025-09-29

GENEVA, Sept. 29 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京都港区虎ノ門一丁目１７番１号), NODA RF TECHNOLOGIES CO., LTD. (5-12 Yoshinocho, Suita-shi, Osaka5640054), 株式会社ノダＲＦテクノロジーズ (大阪府吹田市芳野町５番１２号) filed a patent application (PCT/JP2024/011120) for "PLASMA PROCESSING DEVICE" on Mar 21, 2024. With publication no. WO/2025/...

Click here to read full article from source

To read the full article or to get the complete feed from this publication, please Contact Us.

Exclusive

Category

Source

Publication

Location

INTERNATIONAL PATENT: HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク, NODA RF TECHNOLOGIES CO., LTD., 株式会社ノダＲＦテクノロジーズ FILES APPLICATION FOR "PLASMA PROCESSING DEVICE"