INTERNATIONAL PATENT: HANWHA SOLUTIONS CORPORATION, 한화솔루션 주식회사 FILES APPLICATION FOR "APPARATUS FOR REMOVING RESIDUAL MONOMERS"

GENEVA, Oct. 28 -- HANWHA SOLUTIONS CORPORATION (86 Cheonggyecheon-roJung-guSeoul 04541), 한화솔루션 주식회사 (서울특별시중구청계천로 86) filed a patent application (PCT/KR2025/003634) for "APPARATUS FOR REMOVING RESIDUAL MONOMERS" on Mar 21, 2025. With publication no. WO/2025/220893, the details related to the patent application was published on Oct 23, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): AHAN, Wooyoul (76 Gajeong-roYuseong-guDaejeon 34128), 안우...