INTERNATIONAL PATENT: GUN EI CHEMICAL INDUSTRY CO., LTD., 群栄化学工業株式会社, OSAKA GAS CHEMICALS CO., LTD., 大阪ガスケミカル株式会社 FILES APPLICATION FOR "9,9-BIS(HYDROXYNAPHTHYL)-DIARYLFLUORENE CONDENSATE, METHOD FOR PRODUCING SAME AND COMPOSITION FOR HARD MASK"

Posted On: 2025-10-05

GENEVA, Oct. 5 -- GUN EI CHEMICAL INDUSTRY CO., LTD. (700, Shukuorui-machi, Takasaki-shi, Gunma3700032), 群栄化学工業株式会社 (群馬県高崎市宿大類町７００番地), OSAKA GAS CHEMICALS CO., LTD. (2-37, Chiyozaki 3-chome-minami, Nishi-ku, Osaka-shi, Osaka5500023), 大阪ガスケミカル株式会社 (大阪府大阪市西区千代崎三丁目南２番３７号) filed a patent application (PCT/JP2025/012007) for "9,9-BIS(HYDROXYNAPHTHYL)-DIAR...

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INTERNATIONAL PATENT: GUN EI CHEMICAL INDUSTRY CO., LTD., 群栄化学工業株式会社, OSAKA GAS CHEMICALS CO., LTD., 大阪ガスケミカル株式会社 FILES APPLICATION FOR "9,9-BIS(HYDROXYNAPHTHYL)-DIARYLFLUORENE CONDENSATE, METHOD FOR PRODUCING SAME AND COMPOSITION FOR HARD MASK"