INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND COMPOUND"

GENEVA, Jan. 13 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都港区西麻布２丁目２６番３０号) filed a patent application (PCT/JP2025/023751) for "HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND COMPOUND" on Jul 01, 2025. With publication no. WO/2026/009900, the details related to the patent application was published on Jan 08, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): MIZU...