GENEVA, Nov. 24 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都港区西麻布２丁目２６番３０号) filed a patent application (PCT/JP2025/014904) for "CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING CLEANED SEMICONDUCTOR SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE" on Apr 16, 2025. With publication no. WO/2025/239105, the details related to the patent application was published on Nov 20, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) syst...