INTERNATIONAL PATENT: FUJI POLYMER INDUSTRIES CO., LTD., 富士高分子工業株式会社 FILES APPLICATION FOR "CLEANING PUTTY AND METHOD FOR CLEANING MOUNTED SEMICONDUCTOR PARTS USING SAME"

GENEVA, Nov. 3 -- FUJI POLYMER INDUSTRIES CO., LTD. (FUJIPOLY Bldg., 21-1, Meieki 5-chome, Nakamura-ku, Nagoya-shi, Aichi4500002), 富士高分子工業株式会社 (愛知県名古屋市中村区名駅五丁目２１番１号ＦＵＪＩＰＯＬＹビル) filed a patent application (PCT/JP2024/036089) for "CLEANING PUTTY AND METHOD FOR CLEANING MOUNTED SEMICONDUCTOR PARTS USING SAME" on Oct 09, 2024. With publication no. WO/2025/225051, the details related to the patent application was published on Oct 30, 2025.

Notably, the patent appl...