INTERNATIONAL PATENT: FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. FILES APPLICATION FOR "METHOD AND APPARATUS OF FABRICATING NANOSTRUCTURED SILICON"

GENEVA, July 19 -- FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (HansastraBe 27c80686 Munchen) filed a patent application (PCT/EP2025/050359) for "METHOD AND APPARATUS OF FABRICATING NANOSTRUCTURED SILICON" on Jan 08, 2025. With publication no. WO/2025/149533, the details related to the patent application was published on Jul 17, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): SITTINGER, Volker (c/o Fraunhofer-Institut fur Schicht- und OberflachentechnikReidenkamp 238108 Braunschweig), HOFER, Markus (c/o Fraunhofer-Institut fur Schicht- und OberflachentechnikReidenkam...