GENEVA, Jan. 6 -- EBARA CORPORATION (11-1, Haneda Asahi-cho, Ota-ku, Tokyo1448510), 株式会社荏原製作所 (東京都大田区羽田旭町11番1号) filed a patent application (PCT/JP2025/023159) for "POLISHING LIQUID SUPPLY DEVICE, POLISHING DEVICE, AND POLISHING LIQUID SUPPLY METHOD" on Jun 27, 2025. With publication no. WO/2026/005003, the details related to the patent application was published on Jan 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual Property Organization (WIPO).

Inventor(s): BAE, Ye...