GENEVA, Oct. 5 -- DENKA COMPANY LIMITED (1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo1038338), デンカ株式会社 (東京都中央区日本橋室町二丁目１番１号) filed a patent application (PCT/JP2025/010289) for "CHLOROPRENE POLYMER COMPOSITION, METHOD FOR PRODUCING CHLOROPRENE POLYMER COMPOSITION, AND ADHESIVE COMPOSITION" on Mar 17, 2025. With publication no. WO/2025/205194, the details related to the patent application was published on Oct 02, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the World Intellectual ...