INTERNATIONAL PATENT: DALIAN UNIVERSITY OF TECHNOLOGY, 大连理工大学, NINGBO INSTITUTE OF DALIAN UNIVERSITY OF TECHNOLOGY, 大连理工大学宁波研究院 FILES APPLICATION FOR "FLUORINE-CONTAINING TIN-OXO CLUSTER PHOTORESIST COMPOUND AND USE THEREOF IN PHOTOETCHING FIELD"

GENEVA, Nov. 3 -- DALIAN UNIVERSITY OF TECHNOLOGY (No.2 Linggong Road, Ganjingzi DistrictDalian, Liaoning 116024), 大连理工大学 (中国辽宁省大连市甘井子区凌工路2号), NINGBO INSTITUTE OF DALIAN UNIVERSITY OF TECHNOLOGY (No. 26 Yucai Road, Jiangbei DistrictNingbo, Zhejiang 315016), 大连理工大学宁波研究院 (中国浙江省宁波市江北区育才路26号) filed a patent application (PCT/CN2025/089994) for "FLUORINE-CONTAINING TIN-OXO CLUSTER PHOTORESIST COMPOUND AND USE THEREOF...