INTERNATIONAL PATENT: BEIJING TSD SEMICONDUCTOR CO., LTD., 北京特思迪半导体设备有限公司 FILES APPLICATION FOR "POLYDIMETHYLSILOXANE AMPHIPHOBIC COATING, PREPARATION METHOD THEREFOR AND USE THEREOF"

GENEVA, March 16 -- BEIJING TSD SEMICONDUCTOR CO., LTD. (Building 6, No. 3 Duyang North StreetShunyi District, Beijing 101300), 北京特思迪半导体设备有限公司 (中国北京市顺义区杜杨北街3号院6号楼) filed a patent application (PCT/CN2024/083084) for "POLYDIMETHYLSILOXANE AMPHIPHOBIC COATING, PREPARATION METHOD THEREFOR, AND USE THEREOF" on Mar 21, 2024. With publication no. WO/2025/050615, the details related to the patent application was published on Mar 13, 2025.

Notably, the patent application was submitted under the International Patent Classification (IPC) system...