INTERNATIONAL PATENT: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., 北京北方华创微电子装备有限公司 FILES APPLICATION FOR "METHOD FOR REMOVING PHOTORESIST ON WAFER AND SEMICONDUCTOR PROCESS DEVICE"

GENEVA, March 3 -- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD. (No.8 Wenchang Avenue, Beijing Economic-Technological Development AreaDaxing District, Beijing 100176), 北京北方华创微电子装备有限公司 (中国北京市大兴区北京经济技术开发区文昌大道8号) filed a patent application (PCT/CN2024/113270) for "METHOD FOR REMOVING PHOTORESIST ON WAFER, AND SEMICONDUCTOR PROCESS DEVICE" on Aug 20, 2024. With publication no. WO/2025/040070, the details related to the patent application was published on Feb 27, 2025.

Notably, the pa...