INTERNATIONAL PATENT: ATOMIC NANO MATERIALS AND EQUIPMENT CO., LTD., 南京原磊纳米材料有限公司 FILES APPLICATION FOR "APPARATUS FOR ATOMIC LAYER DEPOSITION ON MULTIPLE LAYERS OF SUBSTRATES"

GENEVA, Sept. 15 -- ATOMIC NANO MATERIALS AND EQUIPMENT CO., LTD. (22nd Floor, Building B, Qingyun Building, 266 Puyun Road, Jiangbei New DistrictNanjing, Jiangsu 210000), 南京原磊纳米材料有限公司 (中国江苏省南京市江北新区浦云路266号青云大厦B栋22层) filed a patent application (PCT/CN2024/096602) for "APPARATUS FOR ATOMIC LAYER DEPOSITION ON MULTIPLE LAYERS OF SUBSTRATES" on May 31, 2024. With publication no. WO/2025/184993, the details related to the patent application was published on Sep 11, 2025.

Notably, the patent application was subm...