GENEVA, Nov. 4 -- ASAHI KASEI KABUSHIKI KAISHA (1-1-2 Yurakucho, Chiyoda-ku, Tokyo1000006), 旭化成株式会社 (東京都千代田区有楽町一丁目１番２号) filed a patent application (PCT/JP2025/015726) for "PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTION METHOD FOR CURED RELIEF PATTERN, CURED FILM, AND PRODUCTION METHOD FOR POLYIMIDE FILM USING SAME" on Apr 23, 2025. With publication no. WO/2025/225649, the details related to the patent application was published on Oct 30, 2025.
Notably, the patent application was submitted under the International Patent Classification (IPC) system, which is managed by the Wo...